Asymmetric extreme ultraviolet scattering from sputter-deposited multilayers

Journal Article · Sat May 01 00:00:00 EDT 1999 · Physical Review B: Condensed Matter and Materials Physics

DOI:https://doi.org/10.1103/PhysRevB.59.13273· OSTI ID:800324

Gullikson, E M ^[1]; Stearns, D G

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1. LBNL Library

No abstract prepared.

• Research Organization: Ernest Orlando Lawrence Berkeley National Lab., Advanced Light Source, Berkeley, CA (US)
• Sponsoring Organization: US Department of Energy (US)
• DOE Contract Number: AC03-76SF00098
• OSTI ID: 800324
• Report Number(s): LBNL/ALS--29537
• Journal Information: Physical Review B: Condensed Matter and Materials Physics, Journal Name: Physical Review B: Condensed Matter and Materials Physics Journal Issue: 20 Vol. 59
• Country of Publication: United States
• Language: English

Related Subjects

43 PARTICLE ACCELERATORS
ADVANCED LIGHT SOURCE
ADVANCED LIGHT SOURCE ALS
ASYMMETRY
SCATTERING