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Actinic detection of sub-100 nm defects on EUVL mask blanks

Journal Article · Mon Nov 01 04:00:00 EST 1999 · Journal of Vacuum Science and Technology B: Microelect. & Nanometer Structures

DOI:https://doi.org/10.1116/1.590944· OSTI ID:800234

Jeong, Seongtae ^[1]; Johnson, L E; Rekawa, S; Walton, C; Prisbrey, Shon T; Tejnil, E; Underwood, J; Bokor, Jeffrey

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Research Organization:: Ernest Orlando Lawrence Berkeley National Lab., Advanced Light Source, Berkeley, CA (US)

Sponsoring Organization:: US Department of Energy (US)

DOE Contract Number:: AC03-76SF00098

OSTI ID:: 800234

Report Number(s):: LBNL/ALS--1684

Journal Information:: Journal of Vacuum Science and Technology B: Microelect. & Nanometer Structures, Journal Name: Journal of Vacuum Science and Technology B: Microelect. & Nanometer Structures Journal Issue: 6 Vol. 17

Country of Publication:: United States

Language:: English

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Related Subjects

43 PARTICLE ACCELERATORS
ADVANCED LIGHT SOURCE
ADVANCED LIGHT SOURCE ALS
DEFECTS
DETECTION