Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Submicron X-ray diffraction and its applications to problems in materials and environmental science

Journal Article · · Review of Scientific Instruments
DOI:https://doi.org/10.1063/1.1436539· OSTI ID:795330

The availability of high brilliance 3rd generation synchrotron sources together with progress in achromatic focusing optics allow to add submicron spatial resolution to the conventional century-old X-ray diffraction technique. The new capabilities include the possibility to map in-situ, grain orientations, crystalline phase distribution and full strain/stress tensors at a very local level, by combining white and monochromatic X-ray microbeam diffraction. This is particularly relevant for high technology industry where the understanding of material properties at a microstructural level becomes increasingly important. After describing the latest advances in the submicron X-ray diffraction techniques at the ALS, we will give some examples of its application in material science for the measurement of strain/stress in metallic thin films and interconnects. Its use in the field of environmental science will also be discussed.

Research Organization:
Ernest Orlando Lawrence Berkeley National Laboratory, Berkeley, CA (US); Advanced Light Source (US)
Sponsoring Organization:
USDOE Director, Office of Science. Office of Basic Energy Studies (US)
DOE Contract Number:
AC03-76SF00098
OSTI ID:
795330
Report Number(s):
LBNL--48049; LBNL/ALS--43878
Journal Information:
Review of Scientific Instruments, Journal Name: Review of Scientific Instruments Journal Issue: 3 Vol. 73; ISSN 0034-6748; ISSN RSINAK
Country of Publication:
United States
Language:
English