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Submicron X-Ray Diffraction and its Applications to Problems in Materials and Environmental Science

Technical Report ·
DOI:https://doi.org/10.2172/800014· OSTI ID:800014
The availability of high brilliance 3rd generation synchrotron sources together with progress in achromatic focusing optics allow to add submicron spatial resolution to the conventional century-old X-ray diffraction technique. The new capabilities include the possibility to map in-situ, grain orientations, crystalline phase distribution and full strain/stress tensors at a very local level, by combining white and monochromatic X-ray microbeam diffraction. This is particularly relevant for high technology industry where the understanding of material properties at a microstructural level becomes increasingly important. After describing the latest advances in the submicron X-ray diffraction techniques at the ALS, we will give some examples of its application in material science for the measurement of strain/stress in metallic thin films and interconnects. Its use in the field of environmental science will also be discussed.
Research Organization:
Stanford Linear Accelerator Center, Menlo Park, CA (US)
Sponsoring Organization:
USDOE Office of Energy Research (ER) (US)
DOE Contract Number:
AC03-76SF00515
OSTI ID:
800014
Report Number(s):
SLAC-PUB-9374
Country of Publication:
United States
Language:
English

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