Deposition of thin films during thermal vaporization of aluminum nitride in a vacuum
Journal Article
·
· High Temperature
OSTI ID:79172
- Institute of High Temperatures, Moscow (Russian Federation)
The results of investigations of the deposition of thin films of aluminum nitride during vacuum-thermal vaporization of the solid phase of aluminum nitride are presented. The films (about 0.6 mcm thick) on a leucosapphire substrate possess an amorphous structure. The maximum deposition rate amounts to 150 {angstrom}/min. It is shown that the deposition rate of films depends on the vapor pressure of the substance being vaporized and the time of heating the vaporizer together with the substance.
- OSTI ID:
- 79172
- Journal Information:
- High Temperature, Journal Name: High Temperature Journal Issue: 1 Vol. 33; ISSN 0018-151X; ISSN HITEA4
- Country of Publication:
- United States
- Language:
- English
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