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Structural analysis of interfacial layers in Ti/Ta/Al Ohmic contacts to n-AlGaN

Journal Article · Tue Aug 01 04:00:00 EDT 2000 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.1323517· OSTI ID:773793

Lim, S H ^[1]; Swider, W; Washburn, J; Liliental-Weber, Z

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Research Organization:: Lawrence Berkeley National Lab., CA (US)

Sponsoring Organization:: USDOE Director, Office of Science. Office of Basic Energy Studies. Division of Materials Sciences (US)

DOE Contract Number:: AC03-76SF00098

OSTI ID:: 773793

Report Number(s):: LBNL--46897

Journal Information:: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 11 Vol. 88; ISSN JAPIAU; ISSN 0021-8979

Country of Publication:: United States

Language:: English

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Related Subjects

36 MATERIALS SCIENCE
ALUMINIUM
ALUMINIUM NITRIDES
ELECTRIC CONTACTS
GALLIUM NITRIDES
INTERFACES
MICROSTRUCTURE
TANTALUM
TITANIUM