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Title: Field Emission and Nanostructure of Carbon Films

Abstract

The results of field emission measurements of various forms of carbon films are reported. It is shown that the films nanostructure is a crucial factor determining the field emission properties. In particular, smooth, pulsed-laser deposited amorphous carbon films with both high and low sp3 contents are poor field emitters. This is similar to the results obtained for smooth nanocrystalline, sp2-bonded carbon films. In contrast, carbon films prepared by hot-filament chemical vapor deposition (HE-CVD) exhibit very good field emission properties, including low emission turn-on fields, high emission site density, and excellent durability. HF-CVD carbon films were found to be predominantly sp2-bonded. However, surface morphology studies show that these films are thoroughly nanostructured, which is believed to be responsible for their promising field emission properties.

Authors:
; ;
Publication Date:
Research Org.:
Oak Ridge National Lab., TN (US)
Sponsoring Org.:
USDOE Office of Science (US)
OSTI Identifier:
755658
Report Number(s):
ORNL/CP-105622
TRN: AH200034%%87
DOE Contract Number:
AC05-00OR22725
Resource Type:
Conference
Resource Relation:
Conference: Materials Research Society Fall Meeting, Boston, MA (US), 11/29/1999--12/03/1999; Other Information: PBD: 29 Nov 1999
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; CARBON; CHEMICAL VAPOR DEPOSITION; DENSITY; FIELD EMISSION; THIN FILMS; MORPHOLOGY; LASER-RADIATION HEATING; PHYSICAL VAPOR DEPOSITION

Citation Formats

Merkulov, V.I., Lowndes, D.H., and Baylor, L.R.. Field Emission and Nanostructure of Carbon Films. United States: N. p., 1999. Web.
Merkulov, V.I., Lowndes, D.H., & Baylor, L.R.. Field Emission and Nanostructure of Carbon Films. United States.
Merkulov, V.I., Lowndes, D.H., and Baylor, L.R.. Mon . "Field Emission and Nanostructure of Carbon Films". United States. doi:. https://www.osti.gov/servlets/purl/755658.
@article{osti_755658,
title = {Field Emission and Nanostructure of Carbon Films},
author = {Merkulov, V.I. and Lowndes, D.H. and Baylor, L.R.},
abstractNote = {The results of field emission measurements of various forms of carbon films are reported. It is shown that the films nanostructure is a crucial factor determining the field emission properties. In particular, smooth, pulsed-laser deposited amorphous carbon films with both high and low sp3 contents are poor field emitters. This is similar to the results obtained for smooth nanocrystalline, sp2-bonded carbon films. In contrast, carbon films prepared by hot-filament chemical vapor deposition (HE-CVD) exhibit very good field emission properties, including low emission turn-on fields, high emission site density, and excellent durability. HF-CVD carbon films were found to be predominantly sp2-bonded. However, surface morphology studies show that these films are thoroughly nanostructured, which is believed to be responsible for their promising field emission properties.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Mon Nov 29 00:00:00 EST 1999},
month = {Mon Nov 29 00:00:00 EST 1999}
}

Conference:
Other availability
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