Field-emission studies of smooth and nanostructured carbon films
- Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831 (United States)
Electron field-emission measurements of carbon films prepared by pulsed-laser deposition (PLD) and hot-filament chemical-vapor deposition (HF-CVD) are reported. Smooth PLD carbon films, with both high- and low-sp{sup 3} contents, appear to be poor field emitters. In contrast, HF-CVD carbon exhibits very good field-emission properties, including the emission turn-on field as low as 9 V/{mu}m, high emission site density, and excellent durability. In addition, HF-CVD was carried out at temperatures below 600 {degree}C, compatible with the use of glass substrates. The promising field-emission properties of HF-CVD carbon are attributed to the nanostructured nature of this material. {copyright} {ital 1999 American Institute of Physics.}
- OSTI ID:
- 365974
- Journal Information:
- Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 9 Vol. 75; ISSN APPLAB; ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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