Laser Ablation Plasma Parameters Influence on the Deposition Process of Amorphous Carbon
- Instituto Nacional de Investigaciones Nucleares, Apdo. Postal 18-1027, C.P. 11801, Mexico DF (Mexico)
- Facultad de Quimica, UAEM, Edo Mex. (Mexico)
- IIM-UNAM (Mexico)
- Mexico
Amorphous carbon (a-C) thin films have recently attracted substantial attention due to their potential applications. The properties of these films, such as density, hardness and internal stress depend mainly on the sp2/sp3 carbon bonding ratio that is controlled by the specific deposition conditions. In the case of thin films deposited by laser ablation, these characteristics are strongly dependent on the laser energy density used during deposition and on the target to substrate distance, and these have an important influence on the energy of the plasma species and on the plasma density. In the present work the plasma plume generated during laser ablation of a carbon target was characterized by means of Optical Emission Spectroscopy and the Langmuir probe technique. The characterized plasma regimes were used for the deposition of a-C films under different ion energies and plasma densities, so that different percentages of sp3 bonds might be formed in the deposits. The films were analyzed using Raman spectroscopy and EELS. The optical absorption of the films was studied as a function of the plasma parameters.
- OSTI ID:
- 20722121
- Journal Information:
- AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 759; ISSN APCPCS; ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
ABLATION
ABSORPTION
AMORPHOUS STATE
CARBON
CHEMICAL BONDS
DENSITY
EMISSION SPECTROSCOPY
ENERGY BEAM DEPOSITION
ENERGY DENSITY
HARDNESS
LANGMUIR PROBE
LASER RADIATION
LASERS
PLASMA
PLASMA DENSITY
PLASMA DIAGNOSTICS
PULSED IRRADIATION
RAMAN SPECTROSCOPY
SUBSTRATES
THIN FILMS