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Low energy helium implantation in evaporated nickel surfaces

Conference ·
OSTI ID:7284767
; ;  [1];  [2]; ;  [3]
  1. Sandia National Labs., Albuquerque, NM (United States)
  2. Max-Planck Inst. for Plasma Physics, Garching (Germany)
  3. Argonne National Lab., IL (United States)

This paper reports data on helium (He) implantation at low energy (100--200eV) in nickel (Ni) that support a concept for He self-pumping in tokamaks, and specifically an experiment in TEXTOR. These data indicate trapping saturates at about 4 {times} 10{sup 19} He/m{sup 2} areal density for He implanted at 100 eV He in Ni at 500{degrees}C. Neither prior implantation of deuterium (D) nor D bombardment of Ni surfaces already containing implanted He significantly changed the He saturation value. A model for trapping capacity and these data were used to predict He self pumping in TEXTOR.

Research Organization:
Sandia National Labs., Albuquerque, NM (United States)
Sponsoring Organization:
DOE; USDOE, Washington, DC (United States)
DOE Contract Number:
AC04-76DP00789
OSTI ID:
7284767
Report Number(s):
SAND-92-0370C; CONF-920311--23; ON: DE92019297
Country of Publication:
United States
Language:
English