Low energy helium implantation in evaporated nickel surfaces

Conference · Tue Sep 01 00:00:00 EDT 1992

OSTI ID:10170017

Nygren, R E; Doyle, B L; Walsh, D S ^[1]; Ottenberger, W ^[2]; Brooks, J N; Krauss, A ^[3]

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1. Sandia National Labs., Albuquerque, NM (United States)
2. Max-Planck Inst. for Plasma Physics, Garching (Germany)
3. Argonne National Lab., IL (United States)

This paper reports data on helium (He) implantation at low energy (100--200eV) in nickel (Ni) that support a concept for He self-pumping in tokamaks, and specifically an experiment in TEXTOR. These data indicate trapping saturates at about 4 {times} 10{sup 19} He/m{sup 2} areal density for He implanted at 100 eV He in Ni at 500{degrees}C. Neither prior implantation of deuterium (D) nor D bombardment of Ni surfaces already containing implanted He significantly changed the He saturation value. A model for trapping capacity and these data were used to predict He self pumping in TEXTOR.

• Research Organization: Sandia National Labs., Albuquerque, NM (United States)
• Sponsoring Organization: USDOE, Washington, DC (United States)
• DOE Contract Number: AC04-76DP00789
• OSTI ID: 10170017
• Report Number(s): SAND--92-0370C; CONF-920311--23; ON: DE92019297
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360101
665300
70 PLASMA PHYSICS AND FUSION TECHNOLOGY
700480
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
COMPONENT DEVELOPMENT
DEUTERIUM IONS
HELIUM IONS
INTERACTIONS BETWEEN BEAMS AND CONDENSED MATTER
ION IMPLANTATION
LIMITERS
MAGNETIC FIELDS
MATERIALS STUDIES
NICKEL
PREPARATION AND FABRICATION
SELF-PUMPING SYSTEMS
TEXTOR TOKAMAK
TRAPPING