Deuterium trapping in helium-implanted nickel

Journal Article · Sat May 01 00:00:00 EDT 1982 · J. Appl. Phys.; (United States)

DOI:https://doi.org/10.1063/1.331133· OSTI ID:5585572

Besenbacher, F; Bottiger, J; Myers, S M

By means of ion-beam-analysis techniques, the trapping of deuterium implanted into nickel preimplanted with helium was investigated in the temperature range 100--500 K. Following room-temperature helium implantations and deuterium implantations at approx.100 K, linear-ramp annealing (1--2 K/min) was carried out, while the deuterium concentration within the near-surface region (0--0.5 ..mu..m) was monitored by use of the nuclear reaction D(/sup 3/He,..cap alpha..)/sup 1/ H. The release curves were analyzed by solving a diffusion equation with the appropriate trapping terms. In addition to trapping by lattice defects, stronger helium-associated traps were found with a binding enthalpy of 0.55 +- 0.05 eV relative to a solution site. We propose that the responsible entities are small helium bubbles observed in the implanted material by transmission electron microscopy.

• Research Organization: Institute of Physics, University of Aarhus, DK-8000 Aarhus C, Denmark
• OSTI ID: 5585572
• Journal Information: J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 53:5; ISSN JAPIA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360104* -- Metals & Alloys-- Physical Properties
ANNEALING
BEAMS
BINDING ENERGY
CHARGED PARTICLES
DATA
DEUTERIUM IONS
ELECTRON MICROSCOPY
ELEMENTS
ENERGY
ENTHALPY
EVEN-ODD NUCLEI
EXPERIMENTAL DATA
HEAT TREATMENTS
HELIUM 3
HELIUM IONS
HELIUM ISOTOPES
HIGH TEMPERATURE
INFORMATION
ION BEAMS
ION IMPLANTATION
IONS
ISOTOPES
LIGHT NUCLEI
LOW TEMPERATURE
MATHEMATICAL MODELS
MEDIUM TEMPERATURE
METALS
MICROSCOPY
NICKEL
NUCLEAR REACTIONS
NUCLEI
NUMERICAL DATA
PHYSICAL PROPERTIES
QUANTITY RATIO
STABLE ISOTOPES
SURFACES
THERMODYNAMIC PROPERTIES
TRANSITION ELEMENTS
TRANSMISSION ELECTRON MICROSCOPY
TRAPPING