Studies of thin-film growth, adsorption, and oxidation by [ital in] [ital situ], real-time, and [ital ex] [ital situ] ion beam analysis

Journal Article · Fri Jul 01 00:00:00 EDT 1994 · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States)

DOI:https://doi.org/10.1116/1.579355· OSTI ID:7277789

Lin, Y ^[1]; Krauss, A R ^[2]; Auciello, O ^[3]; Nishino, Y ^[4]; Gruen, D M ^[2]; Chang, R P.H. ^[5]; Schultz, J A ^[6]

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1. Materials Science and Chamistry Divisions, Argonne National Laboratory, Argonne, Illinois 60439 (United States) Department of Materials Science, Northwestern University, Evanston, Illinois 60208 (United States)
2. Materials Science and Chemistry Divisions, Argonne National Laboratory, Argonne, Illinois 60439 (United States)
3. Microelectronics Center of North Carolina, Electronics Technology Division, Research Triangle Park, North Carolina 27709 (United States)
4. Materials Science and Chemistry Divisions, Argonne National Laboratory, Argonne, Illinois 60439 (United States) Hitachi Energy Research Laboratory, Hitachi City (Japan)
5. Department of Materials Science, Northwestern University, Evanston, Illinois 60208 (United States)
6. Ionwerks, Inc., Houston, Texas 71310 (United Sta

A time-of-flight (TOF) ion scattering and direct recoil spectrometer (ISS/DRS) has been developed to study the surface composition and reconstruction of metals, metal-oxides, and semiconductors, and to provide [ital in] [ital situ] characterization of the thin-film deposition process. The [ital in] [ital situ], real-time study of Pb, Zr, and Ru ultrathin films produced by ion beam sputter deposition is presented here as the first demonstration of TOF-ISS as a means of characterizing monolayer and submonolayer growth, both in UHV and in mTorr oxygen background. The capability of performing surface analysis at pressures [gt]10[sup [minus]3] Torr is unique to pulsed ion beam surface analysis among surface analytical methods and enables the [ital in] [ital situ] monitoring of oxide thin-film growth processes and surface--gas phase reactions. Using angular-resolved ISS combined with Auger electron spectroscopy, we studied the oxygen adsorption and reconstruction of (001) oriented InSb thin-film surfaces. It was found that the adsorption of molecular oxygen on the InSb (001) surface is consistent with the Langmuir model. Oxygen adsorption preferentially occurs on the antimony sites corresponding to the extension of the lattice into the vacuum and reduces the inward contraction of the first two layers of the clean InSb (001) surface relative to the bulk atomic spacing.

• DOE Contract Number: W-31109-ENG-38
• OSTI ID: 7277789
• Journal Information: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States) Vol. 12:4; ISSN 0734-2101; ISSN JVTAD6
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360104* -- Metals & Alloys-- Physical Properties
440800 -- Miscellaneous Instrumentation-- (1990-)
47 OTHER INSTRUMENTATION
ADSORPTION
BEAMS
CHEMICAL REACTIONS
DEPOSITION
ELEMENTS
FILMS
IN-SITU PROCESSING
ION BEAMS
LEAD
MEASURING INSTRUMENTS
METALS
OXIDATION
PERFORMANCE
PLATINUM METALS
PROCESSING
RUTHENIUM
SORPTION
SPECTROMETERS
SURFACE PROPERTIES
THIN FILMS
TIME-OF-FLIGHT SPECTROMETERS
TRANSITION ELEMENTS
ZIRCONIUM