Confined ion beam cylinder sputtering: A new approach

Journal Article · Sat Nov 01 04:00:00 EST 1986 · J. Vac. Sci. Technol., A; (United States)

DOI:https://doi.org/10.1116/1.573647· OSTI ID:7241516

Sharp, D J

A new high rate sputter deposition technique is reported which employs axial projection of an ion beam into a negatively biased target cylinder. The resulting acute incident bombardment angle which occurs on the inner cylinder wall results in a high sputter yield as compared to other cathode sputter configurations. Calculations showed that near-optimal argon ion incidence bombardment angles can be obtained with this technique. The resulting sputtered metal flux had a directional character and was projected radially inward from the cylinder walls and ''downstream.'' Rapid coating rates were observed on substrates placed at the approximate ''focus'' of deposition. Variations in the cylinder bias, the substrate bias, and the substrate--incident ion energy control were shown to modify the morphology of coatings during deposition. TEM showed that near-amorphous or fine grain beryllium films were deposited as a function of substrate--incident argon ion flux (approximately 100 and 30 nm crystallites at 1000 eV at 0.2 and 0.5 mA/cm/sup 2/, respectively) on single crystal NaCl substrates. Ion bombardment during sputter deposition provides a large number of nucleating sites causing numerous small crystallites during condensation of the metal.

• Research Organization: Sandia National Laboratories, Division 1831, Albuquerque, New Mexico 87185
• DOE Contract Number: AC04-76DP00789
• OSTI ID: 7241516
• Journal Information: J. Vac. Sci. Technol., A; (United States), Journal Name: J. Vac. Sci. Technol., A; (United States) Vol. 4:6; ISSN JVTAD
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360101* -- Metals & Alloys-- Preparation & Fabrication
ALKALI METAL COMPOUNDS
ALKALINE EARTH METALS
ARGON IONS
BERYLLIUM
CHARGED PARTICLES
CHLORIDES
CHLORINE COMPOUNDS
COATINGS
COLLISIONS
DEPOSITION
ELEMENTS
ENERGY RANGE
FILMS
HALIDES
HALOGEN COMPOUNDS
ION COLLISIONS
IONS
KEV RANGE
METALS
MORPHOLOGY
NUCLEATION
SODIUM CHLORIDES
SODIUM COMPOUNDS
SPUTTERING
SURFACE COATING
THIN FILMS
VAPOR DEPOSITED COATINGS