Design features of a high-intensity, cesium-sputter/plasma-sputter negative ion source

Journal Article · Wed Jun 01 04:00:00 EDT 1994 · Review of Scientific Instruments; (United States)

DOI:https://doi.org/10.1063/1.1144804· OSTI ID:7239179

Alton, G D; Mills, G D; Dellwo, J ^[1]

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1. Oak Ridge National Laboratory, P.O. Box 2008, Oak Ridge, Tennessee 37831-6368 (United States)

A versatile, high-intensity, negative ion source has been designed and is now under construction which can be operated in either the cesium-sputter or plasma-sputter mode. The cesium-sputter mode can be effected by installation of a newly designed conical-geometry cesium-surface ionizer; for operation in the plasma-sputter mode, the surface ionizer is removed and either a hot filament or rf antenna plasma-discharge igniter is installed. A multicusp magnetic field is specifically provided confining the plasma in the radial direction when the plasma-sputter mode is selected. This arrangement allows comparison of the two modes of operation. Brief descriptions of the design features, ion optics, and anticipated performances of the two source geometries will be presented in this report.

• DOE Contract Number: AC05-84OR21400
• OSTI ID: 7239179
• Journal Information: Review of Scientific Instruments; (United States), Journal Name: Review of Scientific Instruments; (United States) Vol. 65:6; ISSN 0034-6748; ISSN RSINAK
• Country of Publication: United States
• Language: English

Related Subjects

661220* -- Particle Beam Production & Handling
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ALKALI METALS
ANIONS
BEAM OPTICS
BEAMS
CESIUM
CHARGED PARTICLES
CUSPED GEOMETRIES
DESIGN
ELEMENTS
ION BEAMS
ION SOURCES
IONS
MAGNETIC FIELD CONFIGURATIONS
METALS
OPEN CONFIGURATIONS
PLASMA
SPUTTERING
Ta
Targets-- (1992-)