Hydrogen-atom initiated decomposition of monosilane

Journal Article · Thu Dec 16 04:00:00 EST 1976 · J. Phys. Chem.; (United States)

DOI:https://doi.org/10.1021/j100567a001· OSTI ID:7230628

Austin, E R; Lampe, F W

The H-atom initiated decomposition of SiH/sub 4/ at room temperature produces mainly H/sub 2/, Si/sub 2/H/sub 6/, and a solid deposit with trace amounts of Si/sub 3/H/sub 8/ and Si/sub 4/H/sub 10/ appearing later as secondary products. The initial reaction appears to be nearly completely described by a gas-phase conversion of SiH/sub 4/ to Si/sub 2/H/sub 6/ and H/sub 2/ but the secondary gas-phase reactions are strongly influenced by surface reactions involving silicon hydride polymer. Detailed studies of the H--D distribution in the disilane product of an equimolar mixture of SiH/sub 4/ and SiD/sub 4/ show conclusively that the disilane is formed by insertion reactions of SiH/sub 2/, SiHD, and SiD/sub 2/ radicals into SiH/sub 4/ and SiD/sub 4/ and that combination of SiH/sub 3/ and SiD/sub 3/ radicals play virtually no role.

• Research Organization: Pennsylvania State Univ., University Park
• OSTI ID: 7230628
• Journal Information: J. Phys. Chem.; (United States), Journal Name: J. Phys. Chem.; (United States) Vol. 80:26; ISSN JPCHA
• Country of Publication: United States
• Language: English

Related Subjects

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400500* -- Photochemistry
CHEMICAL REACTION KINETICS
CHEMICAL REACTIONS
CRYOGENIC FLUIDS
DECOMPOSITION
DEUTERIUM
ELEMENTS
FLUIDS
HYDRIDES
HYDROGEN
HYDROGEN COMPOUNDS
HYDROGEN ISOTOPES
ISOTOPES
KINETICS
LIGHT NUCLEI
MASS SPECTROSCOPY
MEDIUM TEMPERATURE
NONMETALS
NUCLEI
ODD-ODD NUCLEI
REACTION KINETICS
SILANES
SILICON COMPOUNDS
SPECTROSCOPY
STABLE ISOTOPES