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Isotope exchange during the thermal decomposition of a SiH/sub 4/-SiD/sub 4/ mixture

Journal Article · · Kinet. Catal. (Engl. Transl.); (United States)
OSTI ID:7129345

This paper studies the kinetics of the thermal decomposition of a SiH/sub 4/-SiD/sub 4/ mixture at 400-500 degrees and low pressure. Kinetic curves were obtained for hydrogen formation (H/sub 2/, HD, D/sub 2/), isotope exchange with the initial silane (consumption of SiH/sub 4/ and SiD/sub 4/ and formation of SiH/sub 3/D, SiH/sub 2/D/sub 2/, and SiHD/sub 3/), and formation and subsequent consumption of deuterated disilanes. The data are evidence for the significant contribution of the molecular mechanism for thermal decomposition of silane under these conditions.

Research Organization:
Institute of Chemical Kinetics, Acad. of Sci., Novosibirsk
OSTI ID:
7129345
Journal Information:
Kinet. Catal. (Engl. Transl.); (United States), Journal Name: Kinet. Catal. (Engl. Transl.); (United States) Vol. 26:4, PT. 1; ISSN KICAA
Country of Publication:
United States
Language:
English