Plasma deposition of amorphous metal alloys
This patent describes a method of plasma-depositing amorphous metal alloy coatings on a substrate, consisting of dissociating vapors of organometallic compounds and metalloid hydrides in a reducing gas in a glow discharge environment. The ratio of the partial pressures of the organometallic and the hydride vapors is maintained at a level such that the metalloid content of the resulting coating is within the range of about 20 to 40 atomic percent. The plasma in the flow discharge is characterized by an average electron energy of 1 to 10 eV and electron densities of about 10/sup 9/ to 10/sup 12/cm/sup -3/, the energy being supplied at frequencies within the range of about 0 to 10/sup 10/ Hz.
- Assignee:
- Dept. of Energy, Washington, DC
- Patent Number(s):
- US 4626448
- OSTI ID:
- 7225904
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
360101* -- Metals & Alloys-- Preparation & Fabrication
ALLOYS
AMORPHOUS STATE
COATINGS
DEPOSITION
DISSOCIATION
ELECTRIC DISCHARGES
ELECTRON DENSITY
ENERGY RANGE
EV RANGE
EV RANGE 01-10
FLUIDS
FREQUENCY RANGE
GASES
GLOW DISCHARGES
HYDRIDES
HYDROGEN COMPOUNDS
HZ RANGE
ORGANIC COMPOUNDS
ORGANOMETALLIC COMPOUNDS
PARTIAL PRESSURE
PLASMA
PLASMA ARC SPRAYING
QUANTITY RATIO
SPRAY COATING
SUBSTRATES
SURFACE COATING
VAPORS