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Recombination-enhanced annealing of the E1 and E2 defect levels in 1-MeV-electron--irradiated n-GaAs

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.323161· OSTI ID:7180015
Recombination-enhanced annealing of the E1 (E/subc/-0.08 eV) and E2 (E/subc/-0.18 eV) defect levels in n-GaAs has been studied by deep-level transient spectroscopy (DLTS). The defects are controllably introduced at room temperature by irradiation with 1-MeV electrons. Thermal annealing at reverse and zero bias yields an activation energy of ..delta..E=1.75 +- 0.17 eV and shows that charge-state effects are not operative. Recombination annealing produces an enhancement of several orders of magnitude in the annealing rate and an activation energy of 0.98 +- 0.10 eV. The annealing reaction obeys first-order kinetics and does not saturate with injection currents up to 350 A/cm/sup 2/. The relationship of this data to earlier observations of recombination-enhanced annealing (motion) in GaAs and GaP is discussed as well as the possible implications for injection-mode device degradation. (AIP)
Research Organization:
Bell Laboratories, Murray Hill, New Jersey 07974
OSTI ID:
7180015
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 47:7; ISSN JAPIA
Country of Publication:
United States
Language:
English