Use of tetraneopentylchromium as a precursor for the organometallic chemical vapor deposition of chromium carbide: A reinvestigation

Journal Article · Fri Apr 01 04:00:00 EST 1994 · Chemistry of Materials; (United States)

DOI:https://doi.org/10.1021/cm00040a019· OSTI ID:7167539

Healy, M D; Smith, D C; Elliott, N E; Springer, R W ^[1]; Rubiano, R R ^[2]

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1. Los Alamos National Lab., NM (United States)
2. Massachusetts Institute of Technology, Cambridge, MA (United States)

Thin films of chromium carbide have been grown by organometallic chemical vapor deposition (OMCVD) from tetraneopentylchromium (Cr[CH[sub 2]C(CH[sub 3])[sub 3]][sub 4], CrNp[sub 4]). Deposition was performed in a hot wall, low pressure reactor at 520 and 570[degrees]C and a pressure of 1.33 [times] 10[sup [minus]2] Pa (10[sup [minus]4] Torr). No carrier gas was used. The resulting films were characterized by X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), X-ray diffraction (XRD), scanning electron microscopy (SEM), and elastic recoil detection (ERD). These data show that the films are of high quality, with very low oxygen content, and contain some residual amorphous carbon. Films grown at 570[degrees]C are crystalline. The observed crystalline phase is Cr[sub 7]C[sub 3]. 13 refs., 7 figs., 1 tab.

• OSTI ID: 7167539
• Journal Information: Chemistry of Materials; (United States), Journal Name: Chemistry of Materials; (United States) Vol. 6:4; ISSN CMATEX; ISSN 0897-4756
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360202* -- Ceramics
Cermets
& Refractories-- Structure & Phase Studies
CARBIDES
CARBON COMPOUNDS
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
CHROMIUM CARBIDES
CHROMIUM COMPOUNDS
DEPOSITION
ELECTRON SPECTROSCOPY
ORGANIC COMPOUNDS
ORGANOMETALLIC COMPOUNDS
PHOTOELECTRON SPECTROSCOPY
SPECTROSCOPY
SURFACE COATING
TRANSITION ELEMENT COMPOUNDS
X-RAY SPECTROSCOPY