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Magnetoconductance of metallic Si:B near the metal-insulator transition

Journal Article · · Physical Review, B: Condensed Matter; (United States)
; ;  [1]
  1. City College of the City University of New York, New York, New York 10031 (United States)

The magnetoconductance of {ital p}-type Si:B samples with dopant concentrations just above the metal-insulator transition is negative (positive magnetoresistance) at all measured temperatures between 0.1 and 4.2 K and for magnetic fields up to 9 T. We attribute this to the effects of strong spin-orbit scattering associated with the valence bands in {ital p}-type materials. The magnetoconductivity varies as {ital H}{sup 2} in small magnetic fields and approximately as {ital H}{sup 1/2} at high fields, with deviations from this simple form which become increasingly significant as the metal-insulator transition is approached. Based on the assumption that the high-field magnetoconductance is attributable mainly to electron-electron interactions, a separation of the low-field magnetoconductance into components associated with interactions and localization yields a hole inelastic scattering rate {h bar}/{tau}{sub in} which varies approximately linearly with temperature.

DOE Contract Number:
FG02-84ER45153
OSTI ID:
7164306
Journal Information:
Physical Review, B: Condensed Matter; (United States), Journal Name: Physical Review, B: Condensed Matter; (United States) Vol. 46:11; ISSN 0163-1829; ISSN PRBMD
Country of Publication:
United States
Language:
English

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