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Sheath heating in low-pressure capacitive radio frequency discharges

Thesis/Dissertation ·
OSTI ID:7159982
Capacitively coupled, parallel plate, r.f. discharges are commonly used for materials processing. The electrons in such a discharge gain and lose energy by reflection from the oscillating sheaths which form at the electrodes. Previous models of the electron heating by this mechanism have assumed that the sheath motion is slow compared to the electron thermal velocity, so that the electron energy change from each reflection is small. Here, the heating rate, density, and sheath width relations are derived analytically in the limit of very fast sheath motion. Numerical results are presented spanning the slow and fast limits. Results from particle-in-cell simulations show that in the large-energy-change regime, an electron beam is produced on each sheath expansion. At low pressure, this beam can traverse the plasma and interact with the sheath at the opposite electrode, producing a beam energy and density dependence on the length of the discharge. The beam produces a time and space varying warm tail on the electron energy distribution. Two revised heating models are derived, assuming power-law and two-temperature electron energy distributions, with temporal variation in electron temperature. These revised models yield new predictions for the variation of the power, density, and sheath thickness with applied r.f. voltage. These predictions are compared with simulation results and laboratory experiment. The electron sheath motion is investigated experimentally by observing the signal on a floating probe in the sheath region. This is compared to the signal product by a non-linear circuit model which accounts for the perturbation of the sheath potential by the probe and includes various forms of sheath motion. The experimental observations are consistent with the analytical predictions. Experimental observations of plasma-sheath resonance oscillations are presented which agree with analytical predictions.
Research Organization:
California Univ., Berkeley, CA (United States)
OSTI ID:
7159982
Country of Publication:
United States
Language:
English