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Self-generated stochastic heating in an rf discharge

Technical Report ·
DOI:https://doi.org/10.2172/7034308· OSTI ID:7034308
We have studied the nonlinear dynamics of stochastic heating arising from the reflection of electrons from moving sheaths as an underlying mechanism for electron power deposition in r.f. discharges. We examined the dynamics of the electron collision with the sheaths in the regime in which the sheath motion is small compared to the average electron velocity to de rive a mop that describes the electron motion. We have shown that for high frequency, ({omega}/2{pi}{approx gt}50MHz), the electrons will strike the moving wall with random phase. At low pressures this stochasticity is an intrinsic property of the dynamics. The stochastic electron heating leads to a power law electron distribution. The stochastic heating was determined in both the slow sheath and fast sheath velocity regimes assuming an incident Maxwellian distribution.
Research Organization:
California Univ., Berkeley, CA (United States). Electronics Research Lab.
Sponsoring Organization:
DOE; USDOE, Washington, DC (United States)
DOE Contract Number:
FG03-87ER13727
OSTI ID:
7034308
Report Number(s):
DOE/ER/13727-T2; ON: DE92018558
Country of Publication:
United States
Language:
English