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GaAs/GaAlAs distributed Bragg reflector laser with a focused ion beam, low dose dopant implanted grating

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.100142· OSTI ID:7159258

We report for the first time, the performance of a GaAs/GaAlAs distributed Bragg reflector (DBR) laser using a focused ion beam implanted grating (FIB-DBR). Stripes of Si/sup + +/ with a period of 2300 A and a dose approx.10/sup 14/ cm/sup -2/ are directly implanted into the passive large optical cavity layer to provide the distributed feedback. Surface-emitting light from the second-order grating is observed. Threshold current of 110 mA and single DBR mode operation from 20 to 40 /sup 0/C are obtained. The wavelength tuning rate with temperature is 0.8 A//sup 0/C. The coupling coefficient is estimated to be 15 cm/sup -1/. The results show that FIB technology is practical for distributed feedback and DBR lasers and optoelectronic integrated circuits.

Research Organization:
Department of Electrical Engineering And Computer Sciences, Electronics Research Laboratory, University of California, Berkeley, California 94720
OSTI ID:
7159258
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 53:4; ISSN APPLA
Country of Publication:
United States
Language:
English