X-ray reflection from novel multilayers with variable smoothness and figure. Technical progress report, 1 April 1984-31 March 1985

Technical Report · Mon Apr 01 04:00:00 EST 1985

OSTI ID:7152902

Knight, L V; Thorne, J M

During the period of this contract we have etched grooves with a 1:184 aspect ratio in silicon substrates, and we have bent them cylindrically by oxidation. In addition, we have constructed an optical test bed and measured the radius of curvature and smoothness of various substrates. Several industries have given us vacuum coating systems and three of them are not functional. Our computer codes have been upgraded and used to predict the reflectance of multilayers reported in the literature. We have derived the mathematical relationship between the matrix and iterative formulations of multilayer reflectance. We have measured the density of some of the materials used in thin layers, and will use this together with a computerized data base of atomic scattering factors to refine our calculations.

• Research Organization: Brigham Young Univ., Provo, UT (USA)
• DOE Contract Number: AS08-84DP40199
• OSTI ID: 7152902
• Report Number(s): DOE/DP/40199-1; ON: DE87001926
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
700208* -- Fusion Power Plant Technology-- Inertial Confinement Technology
COHERENT SCATTERING
DIFFRACTION
ELECTROMAGNETIC RADIATION
ELEMENTS
ETCHING
IONIZING RADIATIONS
OPTICAL SYSTEMS
PLASMA DIAGNOSTICS
RADIATIONS
REFLECTION
SCATTERING
SEMIMETALS
SILICON
SOFT X RADIATION
SUBSTRATES
SURFACE FINISHING
X RADIATION
X-RAY DIFFRACTION