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Title: Investigations on the MBE (molecular beam epitaxy) growth and properties of Al/sub y/Ga/sub y/In/sub 1-x-y/AsInP and InGaAs-InAlAs superlattices: Progress report for the period February 1, 1987-December 31, 1987

Technical Report ·
OSTI ID:7149973

Focus of the work was to grow wide-bandgap ternary and quaternary semiconductors InAlAs and InGaAlAs by molecular beam epitaxy and to investigate their electronic, optical and structural characteristics. Techniques being used are x-ray, TEM, photoluminescence and absorption, DLTS, Hall transport, and Raman Spectroscopy. Experiments included both lattice matched and strained layers. We have grown a series of InGaAlAs quaternary alloys lattice matched to InP, covering the bandgap range from 0.75 to 1.45 eV. Low-temperature photoluminescence measurements indicate that the layers are possibly the best ever grown. The excitonic linewidths are extremely narrow and indicate minimal amounts of clustering. The hole lifetimes in the alloys are comparable to those in high-purity GaAs. Deep levels in these alloys are being investigated and several dominant trap centers have been identified. Studies are under way to establish their physico-chemical origin. Preliminary Raman Spectroscopy measurements have been done on the same samples and the data are being analyzed. Intention is to establish the GaAs, AlAs and InAs-like phonon spectra as a function of composition. We have realized the narrowest PL excitonic linewidths in InGaAs/GaAs MQWs. The linewidths /approximately/ 1-2 meV are almost a factor of 3 better than anything ever reported previously. A proper understanding of strained layer epitaxy by non-equilibrium growth techniques such as MBE is emerging for the first time. 27 figs., 2 tabs.

Research Organization:
Michigan Univ., Ann Arbor (USA)
DOE Contract Number:
FG02-86ER45250
OSTI ID:
7149973
Report Number(s):
DOE/ER/45250-1; ON: DE88009105
Country of Publication:
United States
Language:
English