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Title: Investigations on the MBE (molecular beam epitaxy) growth and properties of Al/sub y/Ga/sub y/In/sub 1-x-y/As/InP and InGaAs-InAlAs superlattices: Progress report for the period May 15, 1986-January 31, 1987

Technical Report ·
OSTI ID:6882947

Focus of the work has been to grow wide-bandgap ternary and quaternary semiconductors InAlAs and InGaAlAs by molecular beam epitaxy and to investigate their electronic, optical and structural characteristics. The techniques being used are x-ray, TEM, photoluminescence and absorption, DLTS, Hall transport, impact ionization and pulsed velocity field measurements. The experiments have included both lattice matched and strained layers. It is apparent that the lattice match In/sub 0.52/Al/sub 0.48/As/InP alloys are clustered and dominant D-X trap centers are present in the strained compositions. We are investigating a novel MBE growth technique of growing these alloys directly on GaAs (with a 1 to 4% lattice mismatch) without propagating dislocations. These heteroepitaxial layers and interfaces are being studied by TEM.

Research Organization:
Michigan Univ., Ann Arbor (USA)
DOE Contract Number:
FG02-86ER45250
OSTI ID:
6882947
Report Number(s):
DOE/ER/45250-1; ON: DE87005190
Resource Relation:
Other Information: Portions of this document are illegible in microfiche products
Country of Publication:
United States
Language:
English