Photoresist application by roller coating
Roller coating of AZ1350J photoresist onto 3.75- by 4.5-inch (95 by 114 mm) substrates was investigated as an integral part of an overall, cost-effective hybrid microcircuit (HMC) photolithography process. This process involved making several HMCs on a single substrate and was accordingly termed Multiple HMC Processing. New equipment was needed to process these multiple HMCs with sufficient parameter control to achieve the designed electrical characteristics. The roller coater study centered around the investigation and the control of those parameters which influence the dimensional quality of the thin-film, resistor-conductor pattern. General system operation, orientation to other processing equipment, and maintenance-facility considerations were also studied. The most important technical aspect of the photoresist coating is the thickness uniformity followed by the overall photoresist thickness. Three equipment variables: doctor bar pressure, roller/substrate interference, and roller thread configuration were found to control the overall resist thickness and thickness uniformity. Photoresist viscosity was also identified, with its relation to the roller thread configuration, to control the thickness and thickness uniformity.
- Research Organization:
- Bendix Corp., Kansas City, Mo. (USA)
- DOE Contract Number:
- E(29-1)-613
- OSTI ID:
- 7148243
- Report Number(s):
- BDX-613-1288
- Country of Publication:
- United States
- Language:
- English
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