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Preparation of diamondlike carbon films by high-intensity pulsed-ion-beam deposition

Journal Article · · Journal of Applied Physics; (United States)
DOI:https://doi.org/10.1063/1.358373· OSTI ID:7126814
; ; ; ; ; ; ;  [1]; ; ;  [2]; ;  [3];  [4];  [5]
  1. Los Alamos National Laboratory, MS-E526, Los Alamos, New Mexico 87545 (United States)
  2. SI Diamond Technology Incorporated, 2435 North Boulevard, Houston, Texas 77098 (United States)
  3. Sandia National Laboratory P.O. Box 5800, Albuquerque, New Mexico 87185-0343 (United States)
  4. Department of Materials Science and Engineering, Lehigh University, Bethlehem, Pennsylvania 18015-3195 (United States)
  5. University of New Mexico/Center of Micro-Engineered Ceramics, Albuquerque, New Mexico 87131 (United States)
Diamondlike carbon (DLC) films were prepared by high-intensity pulsed-ion-beam ablation of graphite targets. A 350 keV, 35 kA, 400 ns beam, consisting primarily of hydrogen, carbon, and oxygen ions was focused onto a graphite target at a fluence of 15--45 J/cm[sup 2]. Amorphous carbon films were deposited at up to 30 nm per pulse, corresponding to an instantaneous deposition rate greater than 1 mm/s. Electrical resistivities were between 1 and 1000 [Omega] cm. Raman spectra indicate that diamondlike carbon is present in most of the films. Electron-energy-loss spectroscopy indicates significant amounts of [ital sp][sup 3]-bonded carbon, consistent with the presence of DLC. Scanning electron microscopy showed most films contain 100 nm features, but micron size particles were deposited as well. Initial tests revealed favorable electron field-emission behavior.
OSTI ID:
7126814
Journal Information:
Journal of Applied Physics; (United States), Journal Name: Journal of Applied Physics; (United States) Vol. 76:10; ISSN JAPIAU; ISSN 0021-8979
Country of Publication:
United States
Language:
English