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Synchrotron radiation assisted deposition of aluminum oxide from condensed layers of trimethylaluminum and water at 78 K

Journal Article · · Applied Physics Letters; (United States)
DOI:https://doi.org/10.1063/1.107781· OSTI ID:7111124
;  [1];  [2]
  1. Department of Chemistry, State University of New York, Stony Brook, New York 11794 (United States)
  2. Physics Department, Brookhaven National Laboratory, Upton, New York 11973 (United States)
Spectroscopic evidence is presented that shows that synchrotron irradiation of trimethylaluminum (TMA) and water at 78 K on a silver substrate produces pure layers of aluminum oxide. Near-edge x-ray absorption fine structure and core level photoelectron spectroscopies are used to characterize the Al{sub 2}O{sub 3} layer, which was 30 A thick. The carbon component in the alkylaluminum precursor is completely removed during irradiation as volatile methane product. In the absence of synchrotron radiation the molecular precursors show evidence of some interactions within the solid, but upon warming to ambient temperatures (260 K) the adsorbed layers desorb from the substrate.
DOE Contract Number:
AC02-76CH00016
OSTI ID:
7111124
Journal Information:
Applied Physics Letters; (United States), Journal Name: Applied Physics Letters; (United States) Vol. 61:6; ISSN APPLA; ISSN 0003-6951
Country of Publication:
United States
Language:
English