Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Double-heterostructure GaAs-GaAlAs injection lasers on semi-insulating substrates using carrier crowding

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.89662· OSTI ID:7110507

GaAs-GaAlAs double-heterostructure lasers were fabricated on semi-insulating substrates. Laser action based on carrier confinement via the crowding effect has been demonstrated. Laser action takes place in a narrow (10--20 ..mu..m) region near the edge of the mesa where the current is injected. The threshold current is low and is comparable to that of stripe-geometry lasers.

Research Organization:
California Institute of Technology, Pasadena, California 91125
OSTI ID:
7110507
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 31:4; ISSN APPLA
Country of Publication:
United States
Language:
English

Similar Records

Striped-substrate double-heterostructure lasers
Journal Article · Tue Jul 01 00:00:00 EDT 1975 · IEEE J. Quant. Electron., v. QE-11, no. 7, pp. 418-420 · OSTI ID:4152522

Study of lateral modes in wide double-heterostructure GaAs-GaAlAs laser diodes
Journal Article · Tue Feb 28 23:00:00 EST 1978 · J. Appl. Phys.; (United States) · OSTI ID:5015718

Buried double heterostructure laser device
Patent · Mon Oct 27 23:00:00 EST 1980 · OSTI ID:6362049