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Effect of x-ray radiation on MOSFET's (SIMOX) LF excess noise

Journal Article · · IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States)
DOI:https://doi.org/10.1109/23.277519· OSTI ID:7108288
;  [1];  [2]
  1. Univ. Bordeaux 1, IXL-URA 846//CNRS 351 cours de la Liberation 33405 Talence Cedex (FR)
  2. Leray CEA-DAM, B.P. 12, 92000 Bruyere-le-Chatel (FR)

This paper is related to the behavior of hardened n-MOS and p-MOS transistors (SOI-SIMOX technology). These elementary components have been irradiated by X-ray radiation after an electrical characterization. In addition to the electrical parameters as the threshold voltage V{sub t}, the transconductance g{sub m} and the leakage drain current I{sub df0}, it appears interesting to observe the channel noise level shift before and after irradiation at different doses. The particular interest of this analysis is found in the behavior of SOI-SIMOX technology transistors.

OSTI ID:
7108288
Journal Information:
IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States), Journal Name: IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States) Vol. 39:3; ISSN 0018-9499; ISSN IETNA
Country of Publication:
United States
Language:
English