Development of the water window imaging x-ray microscope utilizing normal-incidence multilayer optics
Journal Article
·
· Optical Engineering; (United States)
- NASA Marshall Space Flight Center, Space Science Lab., Huntsville, AL (US)
- Univ. of Alabama at Birmingham, Dept. of Physics, Birmingham, AL (US)
- Univ. of Alabama at Birmingham, Dept. of Cell Biology and Anatomy, Birmingham, AL (US)
- Baker Consulting, Walnut Creek, CA (US)
- Lawrence Livermore National Lab., Livermore, CA (US)
In this paper, the authors describe the development of the water window imaging x-ray microscope based on normal-incidence multilayer x-ray mirrors. The narrow bandpass response inherent in multilayer x-ray optics is accurately tuned to wavelengths within the water window. Similar doubly-reflecting multilayer optical systems have bee fabricated for our astronomical rocket-borne x-ray/EUV telescopes. Previous theoretical studies that high-resolution multilayer x-ray imaging microscopes are possible by using either spherical optics or aspherical configurations. These microscopes require ultrasmooth mirror substrates, which have been fabricated using advanced flow polishing methods. Hemlite-grade sapphire microscope optic substrates have been accurately figured and polished to a smoothness of 0.5-{Angstrom} rms, as measured by the Zygo profilometer. The authors describe the current status of fabrication and testing of the optical and mechanical subsystems for the water window imaging x-ray microscope. This new instrument should yield images of carbon-based microstructures within living cells of unprecedented spatial resolution and contrast, without need for fixatives, dyes, and chemical additives.
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 7108275
- Journal Information:
- Optical Engineering; (United States), Journal Name: Optical Engineering; (United States) Vol. 30:8; ISSN 0091-3286; ISSN OPEGA
- Country of Publication:
- United States
- Language:
- English
Similar Records
Design of a normal incidence multilayer imaging X-ray microscope
X-ray/EUV optics for astronomy and microscopy; Proceedings of the Meeting, San Diego, CA, Aug. 7-11, 1989
X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography; Proceedings of the Meeting, San Diego, CA, July 9-13, 1990
Journal Article
·
Sat Dec 31 23:00:00 EST 1988
· Journal of X-ray Science and Technology; (USA)
·
OSTI ID:6426286
X-ray/EUV optics for astronomy and microscopy; Proceedings of the Meeting, San Diego, CA, Aug. 7-11, 1989
Conference
·
Sat Dec 31 23:00:00 EST 1988
·
OSTI ID:6317287
X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography; Proceedings of the Meeting, San Diego, CA, July 9-13, 1990
Conference
·
Mon Dec 31 23:00:00 EST 1990
·
OSTI ID:5408161
Related Subjects
440600* -- Optical Instrumentation-- (1990-)
47 OTHER INSTRUMENTATION
CARBON COMPOUNDS
CRYSTAL STRUCTURE
ELECTROMAGNETIC RADIATION
EQUIPMENT
EXTREME ULTRAVIOLET RADIATION
FABRICATION
IMAGES
INCIDENCE ANGLE
IONIZING RADIATIONS
MICROSCOPES
MICROSTRUCTURE
MIRRORS
OPTICAL SYSTEMS
RADIATIONS
RESOLUTION
ROCKETS
TELESCOPES
TESTING
ULTRAVIOLET RADIATION
X RADIATION
X-RAY EQUIPMENT
47 OTHER INSTRUMENTATION
CARBON COMPOUNDS
CRYSTAL STRUCTURE
ELECTROMAGNETIC RADIATION
EQUIPMENT
EXTREME ULTRAVIOLET RADIATION
FABRICATION
IMAGES
INCIDENCE ANGLE
IONIZING RADIATIONS
MICROSCOPES
MICROSTRUCTURE
MIRRORS
OPTICAL SYSTEMS
RADIATIONS
RESOLUTION
ROCKETS
TELESCOPES
TESTING
ULTRAVIOLET RADIATION
X RADIATION
X-RAY EQUIPMENT