X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography; Proceedings of the Meeting, San Diego, CA, July 9-13, 1990
Topics discussed in this issue include the fabrication of multilayer X-ray/EUV coatings; the design, characterization, and test of multilayer X-ray/EUV coatings; multilayer X-ray/EUV monochromators and imaging microscopes; X-ray/EUV telescopes; the test and calibration performance of X-ray/EUV instruments; XUV/soft X-ray projection lithography; X-ray/EUV space observatories and missions; X-ray/EUV telescopes for solar research; X-ray/EUV polarimetry; X-ray/EUV spectrographs; and X-ray/EUV filters and gratings. Papers are presented on the deposition-controlled uniformity of multilayer mirrors, interfaces in Mo/Si multilayers, the design and analysis of an aspherical multilayer imaging X-ray microscope, recent developments in the production of thin X-ray reflecting foils, and the ultraprecise scanning technology. Consideration is also given to an active sun telescope array, the fabrication and performance at 1.33 nm of a 0.24-micron-period multilayer grating, a cylindrical proportional counter for X-ray polarimetry, and the design and analysis of the reflection grating arrays for the X-Ray Multi-Mirror Mission.
- Research Organization:
- National Aeronautics and Space Administration, Huntsville, AL (United States). George C. Marshall Space Flight Center
- OSTI ID:
- 5408161
- Report Number(s):
- CONF-9007157-; ISBN: 0-8194-0404-7
- Resource Relation:
- Conference: Society of Photo-Optical Instrumentation Engineers (SPIE) conference on EUV x-ray and gamma-ray instrumentation for astronomy, San Diego, CA (United States), 8-13 Jul 1990
- Country of Publication:
- United States
- Language:
- English
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440800* - Miscellaneous Instrumentation- (1990-)