Ion beam analysis for depth profiling

Journal Article · Wed Jul 01 04:00:00 EDT 1992 · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States)

DOI:https://doi.org/10.1116/1.577959· OSTI ID:7105458

Knapp, J A; Barbour, J C; Doyle, B L ^[1]

---

1. Sandia National Laboratories, Albuquerque, New Mexico 87185-5800 (United States)

New techniques in the application of ion beam analysis to depth profiling in solids are briefly surveyed. These include (1) non-Rutherford backscattering analysis using high energy beams, (2) resonant nuclear reaction analysis, (3) time-of-flight elastic recoil detection spectrometry, and (4) heavy ion backscattering spectrometry. The last can be used for very precise depth profiling in one configuration, or as a very sensitive trace contaminant analysis in another configuration.

• DOE Contract Number: AC04-76DP00789
• OSTI ID: 7105458
• Journal Information: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States) Vol. 10:4; ISSN JVTAD; ISSN 0734-2101
• Country of Publication: United States
• Language: English

Related Subjects

665300* -- Interactions Between Beams & Condensed Matter-- (1992-)
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
BEAM DYNAMICS
BEAMS
CHEMICAL ANALYSIS
COLLISIONS
CRYSTAL STRUCTURE
ELASTIC SCATTERING
ION BEAMS
ION COLLISIONS
ION MICROPROBE ANALYSIS
ION SPECTROSCOPY
MICROANALYSIS
NONDESTRUCTIVE ANALYSIS
RUTHERFORD SCATTERING
SCATTERING
SPECTROSCOPY
TIME-OF-FLIGHT METHOD