Chemically bound hydrogen in CVD Si/sub 3/N/sub 4/: dependence on NH/sub 3//SiH/sub 4/ ratio and on annealing

Journal Article · Wed Jun 01 00:00:00 EDT 1977 · J. Electrochem. Soc.; (United States)

DOI:https://doi.org/10.1149/1.2133451· OSTI ID:7100580

Stein, H J ^[1]; Wegener, H A.R.

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1. Sandia Labs., Albuquerque, NM

The effects of the ammonia-to-silane ratio, R, during deposition and of postdeposition heating on chemically bound H in 1000A silicon nitride films were investigated by using miltiple internal reflection (MIR) spectroscopy. The films were deposited at 700/sup 0/C with R equal to 10:1, 100:1, and 1000:1 in an Ar carrier gas. Vibrational modes for N-H and Si-H bonded centers show that H is incorporated into the films. The sum of the NH and SiH band intensities (total bound H) increased with R. The SiH band intensity, however, was largest in the 100:1 film. The increase in bound H with R is attributed to an increase in reactive H from NH/sub 3/ decomposition in the presence of incompletely bonded Si and N. The decrease in SiH centers when R is increased from 100:1 to 1000:1 is attributed to more complete Si-N bonding. Annealing behavior at 800/sup 0/C suggests an initial transfer of H from N-H to Si-H bonds in 10:1 and 100:1 films consistent with the presence of incompletely bonded Si. Bonding of implanted H in Si/sub 3/N/sub 4/ was demonstrated by isotopic substitution of D for H, and a calibration to determine H concentrations from MIR measurements was obtained. Bond energy-limited H loss is suggested to explain an observed mass-independent annealing for implantation-produced NH and ND centers. 9 figures.

• OSTI ID: 7100580
• Journal Information: J. Electrochem. Soc.; (United States), Journal Name: J. Electrochem. Soc.; (United States) Vol. 124:6; ISSN JESOA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360202* -- Ceramics
Cermets
& Refractories-- Structure & Phase Studies
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400201 -- Chemical & Physicochemical Properties
AMMONIA
ANNEALING
CHEMICAL BONDS
CHEMICAL COATING
CHEMICAL COMPOSITION
CHEMICAL VAPOR DEPOSITION
CRYOGENIC FLUIDS
DEPOSITION
ELEMENTS
ENERGY LEVELS
EXCITED STATES
FLUIDS
HEAT TREATMENTS
HEATING
HIGH TEMPERATURE
HYDRIDES
HYDROGEN
HYDROGEN COMPOUNDS
NITRIDES
NITROGEN
NITROGEN COMPOUNDS
NITROGEN HYDRIDES
NONMETALS
PNICTIDES
SEMIMETALS
SILANES
SILICON
SILICON COMPOUNDS
SILICON NITRIDES
SURFACE COATING
VERY HIGH TEMPERATURE
VIBRATIONAL STATES