Nanoindentation of Ag/Ni multilayered thin films

Journal Article · Sun May 15 00:00:00 EDT 1994 · Journal of Applied Physics; (United States)

DOI:https://doi.org/10.1063/1.355787· OSTI ID:7072924

Ruud, J A ^[1]; Jervis, T R ^[2]; Spaepen, F ^[1]

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1. Division of Applied Sciences, Harvard University, Cambridge, Massachusetts 02138 (United States)
2. Los Alamos National Laboratory, Los Alamos, New Mexico 87545 (United States)

Nanoindentation was used to study the mechanical properties of Ag/Ni multilayered thin films. Both the hardness and the elastic modulus of the multilayered thin films had values between those for homogeneous Ag and Ni thin films. The trend in the hardness with layer repeat length can be explained by the effects of both the stress and the microstructure. No evidence for interfacial effects on hardness was found. A decrease in modulus at the smallest repeat lengths was compared with literature data on the elastic constants of Ag/Ni multilayers.

• DOE Contract Number: W-7405-ENG-36
• OSTI ID: 7072924
• Journal Information: Journal of Applied Physics; (United States), Journal Name: Journal of Applied Physics; (United States) Vol. 75:10; ISSN JAPIAU; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360103* -- Metals & Alloys-- Mechanical Properties
ELEMENTS
FILMS
INTERFACES
MECHANICAL PROPERTIES
METALS
MICROSTRUCTURE
NICKEL
SILVER
STRESSES
THIN FILMS
TRANSITION ELEMENTS