The photoemission spectromicroscope multiple-application x-ray imaging undulator microscope (MAXIMUM)
Journal Article
·
· Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA)
- Department of Physics, University of Wisconsin, Madison, WI (USA) Department of Electrical and Computer Engineering, University of Wisconsin, Madison, WI (USA) Synchrotron Radiation Center, University of Wisconsin, Madison, WI (USA)
- Center for X-Ray Optics, Lawrence Berkeley Laboratory, Berkeley, CA (USA)
We discuss the implementation of phase I of the spectromicroscopy program MAXIMUM (multiple-application x-ray imaging undulator microscope) at the Wisconsin Synchrotron Radiation Center. Successful feasibility tests included taking photoemission micrographs with lateral resolution of a few microns, line scans, knife-edge tests, photon flux measurements, and characterization of the focusing performance.
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 7049494
- Journal Information:
- Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA) Vol. 8:3; ISSN JVTAD; ISSN 0734-2101
- Country of Publication:
- United States
- Language:
- English
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