Installation of the MAXIMUM microscope at the ALS
- Lawrence Berkeley Lab., CA (United States)
- Univ. of Wisconsin, Stoughton, WI (United States). Center for X-ray Lithography
The MAXIMUM scanning x-ray microscope, developed at the Synchrotron Radiation Center (SRC) at the University of Wisconsin, Madison was implemented on the Advanced Light Source in August of 1995. The microscope`s initial operation at SRC successfully demonstrated the use of multilayer coated Schwarzschild objective for focusing 130 eV x-rays to a spot size of better than 0.1 micron with an electron energy resolution of 250meV. The performance of the microscope was severely limited, because of the relatively low brightness of SRC, which limits the available flux at the focus of the microscope. The high brightness of the ALS is expected to increase the usable flux at the sample by a factor of 1,000. The authors will report on the installation of the microscope on bending magnet beamline 6.3.2 at the ALS and the initial measurement of optical performance on the new source, and preliminary experiments with surface chemistry of HF etched Si will be described.
- Research Organization:
- Lawrence Berkeley Lab., CA (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 195697
- Report Number(s):
- LBL--37873; LSBL--291; CONF-9510119--8; ON: DE96004743
- Country of Publication:
- United States
- Language:
- English
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