Installation of the MAXIMUM microscope at the ALS

Journal Article · Sun Sep 01 04:00:00 EDT 1996 · Review of Scientific Instruments

DOI:https://doi.org/10.1063/1.1147384· OSTI ID:389553

Ng, W; Perera, R; Underwood, J; Singh, S; Solak, H; Cerrina, F ^[1]

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1. Lawrence Berkeley National Laboratory, Berkeley, CA 94720 Center for X-ray Lithography, University of Wisconsin -- Madison Stoughton, WI 53589 (United States)

The MAXIMUM scanning x-ray microscope, developed at the Synchrotron Radiation Center (SRC) at the University of Wisconsin {endash} Madison, was implemented on the Advanced Light Source (ALS) in August of 1995. The microscope{close_quote}s initial operation at SRC successfully demonstrated the use of a multilayer-coated Schwarzschild objective for focusing 130 eV x-rays to a spot size of better than 0.1 micron with an electron energy resolution of 250 meV. The performance of the microscope was severely limited because of the relatively low brightness of SRC, which limits the available flux at the focus of the microscope. The high brightness of the ALS is expected to increase the usable flux at the sample by a factor of 1000. We will report on the installation of the microscope on bending magnet beamline 6.3.2 at the ALS and the initial measurement of optical performance on the new source, and preliminary experiments on the surface chemistry of HF-etched Si will be described. {copyright} {ital 1996 American Institute of Physics.}

• OSTI ID: 389553
• Report Number(s): CONF-9510119--
• Journal Information: Review of Scientific Instruments, Journal Name: Review of Scientific Instruments Journal Issue: 9 Vol. 67; ISSN 0034-6748; ISSN RSINAK
• Country of Publication: United States
• Language: English

Related Subjects

43 PARTICLE ACCELERATORS
44 INSTRUMENTATION
INCLUDING NUCLEAR AND PARTICLE DETECTORS
ADVANCED LIGHT SOURCE
MICROSCOPES
OPTICAL SYSTEMS
PERFORMANCE TESTING
RADIATION FLUX
SYNCHROTRON RADIATION
USES
X RADIATION