A new scanning photoemission microscope for ELETTRA: SuperMAXIMUM

Journal Article · Sun Sep 01 04:00:00 EDT 1996 · Review of Scientific Instruments

DOI:https://doi.org/10.1063/1.1147500· OSTI ID:389551

Welnak, J T; Solak, H; Wallace, J; Cerrina, F; Barbo, F; Bertolo, M; Bianco, A; Di Fonzo, S; Fontana, S; Jark, W; Mazzolini, F; Rosei, R; Savoia, A; Underwood, J; Margaritondo, G ^[1]

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1. University of WI--Center for X ray Lithography, 3731 Schneider Drive, Stoughton, WI 53589 (United States)

High brightness, third-generation synchrotrons allow diffraction-limited performance and large flux for scanning photoemission microscopes. A new microscope, SuperMAXIMUM, is being developed at the University of Wisconsin Center for X ray Lithography in collaboration with the Sincrotrone Trieste. The beamline, being built in Trieste, uses a variable angle spherical grating monochromator (VASGM). A combination of rotation of a plane mirror and rotation of the spherical grating keeps the slit positions and beam directions fixed. The microscope objectives are normal-incidence, multilayer-coated Schwarzschild objectives. The project, which is nearing completion, utilizes novel designs for optics alignment, sample rastering mechanics, and software control. We will discuss the project status, new designs, and techniques. {copyright} {ital 1996 American Institute of Physics.}

• OSTI ID: 389551
• Report Number(s): CONF-9510119--
• Journal Information: Review of Scientific Instruments, Journal Name: Review of Scientific Instruments Journal Issue: 9 Vol. 67; ISSN 0034-6748; ISSN RSINAK
• Country of Publication: United States
• Language: English

Related Subjects

43 PARTICLE ACCELERATORS
44 INSTRUMENTATION
INCLUDING NUCLEAR AND PARTICLE DETECTORS
ALIGNMENT
DESIGN
MICROSCOPES
OPTICAL SYSTEMS
RADIATION FLUX
SYNCHROTRON RADIATION SOURCES
USES
X RADIATION