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Efficient, long pulse XeF(C. -->. A) laser at moderate electron beam pump rate

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.99798· OSTI ID:7043522

Efficient, long pulse lasing on the XeF(C..-->..A) electronic transition has been demonstrated in an electron beam pumped device at a moderate pump rate of approx.250 kW/cm/sup 3/ . A mixture of F/sub 2/, NF/sub 3/, Xe, Kr, and Ar at a total gas pressure of 1.6 atm was excited with a 700-ns pulse. Lasing occurred for 400 ns during the excitation pulse. The laser spectrum showed a peak wavelength of 483 nm and a bandwidth of 16 nm. An intrinsic efficiency of 0.7% was determined. The laser output energy was 1 J. Further improvements in laser performance are expected under fully optimized conditions.

Research Organization:
Avco Research Laboratory, Inc., 2385 Revere Beach Parkway, Everett, Massachusetts 02149
OSTI ID:
7043522
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 53:18; ISSN APPLA
Country of Publication:
United States
Language:
English