New electron-beam pumped XeF laser at 486 nm

Journal Article · Sun Jul 01 04:00:00 EDT 1979 · Appl. Phys. Lett.; (United States)

DOI:https://doi.org/10.1063/1.90909· OSTI ID:6231501

Ernst, W E; Tittel, F K

Laser emission has been observed from XeF on the C (3/2) ..-->..A (3/2) transition at 486 nm with a spectral bandwidth of 12 nm. A peak laser power of 5 kW was obtained from Ar/Xe/NF/sub 3/ mixtures in the ratio of 600 : 2 : 1 at total pressures of 350--800 kPa excited by 1-MeV 20-kA electron-beam pulses of 8-ns duration. Lasing can also occur on the usual B (1/2) ..-->..X (1/2) transition at 353 nm with an appropriate set of cavity reflectors under the same operating conditions.

• Research Organization: Electrical Engineering Department, Rice University, Houston, Texas 77001
• OSTI ID: 6231501
• Journal Information: Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 35:1; ISSN APPLA
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
420300* -- Engineering-- Lasers-- (-1989)
BEAMS
CAVITIES
DISPERSIONS
ELECTRON BEAMS
ELEMENTS
EMISSION
FLUORINE
GAS LASERS
HALOGENS
LASERS
LEPTON BEAMS
MEDIUM PRESSURE
MIXTURES
NONMETALS
PARTICLE BEAMS
RARE GASES
REFLECTION
WAVELENGTHS
XENON