490-nm XeF electric discharge laser

Journal Article · Sun Jul 01 04:00:00 EDT 1979 · Appl. Phys. Lett.; (United States)

DOI:https://doi.org/10.1063/1.90919· OSTI ID:6040116

Fisher, C H; Mullaney, G J; McDaniel, J P

Lasing at 490 nm in the broadband XeF (C 3/2..-->..A 3/2) transition has been achieved in He/Xe/NF/sub 3/ gas mixtures excited by a uv preionized electric discharge. Measurements of the C..-->..A laser spectrum show a bandwidth of approximately 40 nm centered around 490 nm, indicating that the laser should be tunable over a wide spectral region in the visible.

• Research Organization: Mathematical Sciences Northwest, Incorporated, Bellevue, Washington 98009
• OSTI ID: 6040116
• Journal Information: Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 35:1; ISSN APPLA
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
420300* -- Engineering-- Lasers-- (-1989)
CRYOGENIC FLUIDS
DISPERSIONS
ELECTRIC DISCHARGES
ELECTROMAGNETIC RADIATION
ELEMENTS
ENERGY-LEVEL TRANSITIONS
FLUIDS
FLUORINE
GAS LASERS
HALOGENS
HELIUM
IONIZATION
LASERS
MIXTURES
NITROGEN
NONMETALS
RADIATIONS
RARE GASES
SPECTRA
TUNING
ULTRAVIOLET RADIATION
WAVELENGTHS
XENON