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A reduction in the Staebler-Wronski effect observed in low H content a-Si:H films deposited by the hot wire technique

Conference · · AIP Conference Proceedings (American Institute of Physics); (United States)
OSTI ID:7042113
 [1];  [2]
  1. Solar Energy Research Institute, Golden, Colorado 80401-3393 (United States)
  2. Institute of Physics, CSAV, Prague 8, CS-18040 (Czechoslovakia)

Constant photocurrent (CPM) and steady state photograting (SSPG) measurements have been performed on a series of hot wire (HW) and glow discharge (GD) hydrogenated amorphous silicon (a-Si:H) films, where the substrate temperature was varied in each case to affect the bonded H content. A reduction in the magnitude of the Staebler-Wronski effect, as observed by CPM after saturation light soaking, is seen when the H content is reduced in both sets of samples, but the lowest saturated CPM values and the highest SSPG diffusion lengths measured after saturation occur for HW films having H contents in the range 1-4 at.%. Although correlations exist between the number of excess defects produced by saturation light soaking and microscopic parameters such as the H content and the optical bandgap, there is not a simple correspondece for both sets of samples. This suggests that the Staebler-Wronski saturation may be influenced in part by the film microstructure.

DOE Contract Number:
AC02-83CH10093
OSTI ID:
7042113
Report Number(s):
CONF-910225--
Journal Information:
AIP Conference Proceedings (American Institute of Physics); (United States), Journal Name: AIP Conference Proceedings (American Institute of Physics); (United States) Vol. 234:1; ISSN 0094-243X; ISSN APCPC
Country of Publication:
United States
Language:
English