Vapor deposition of thin films
Patent
·
OSTI ID:7018945
This patent describes a nanocrystalline film, it comprises: a substantially carbon-free metal selected from the group consisting of rhodium, iridium, molybdenum, tungsten, rhenium, platinum, or palladium.
- Assignee:
- Dept. of Energy, Washington, DC (United States)
- Patent Number(s):
- A; US 5149596
- Application Number:
- PPN: US 7-593839
- OSTI ID:
- 7018945
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
36 MATERIALS SCIENCE
360201* -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
360202 -- Ceramics
Cermets
& Refractories-- Structure & Phase Studies
665300 -- Interactions Between Beams & Condensed Matter-- (1992-)
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
CRYSTAL STRUCTURE
DEPOSITION
ELEMENTS
FILMS
GRAIN SIZE
IRIDIUM
METALS
MICROSTRUCTURE
MOLYBDENUM
PALLADIUM
PLATINUM
PLATINUM METALS
RHENIUM
RHODIUM
SIZE
SURFACE COATING
THIN FILMS
TRANSITION ELEMENTS
TUNGSTEN
360201* -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
360202 -- Ceramics
Cermets
& Refractories-- Structure & Phase Studies
665300 -- Interactions Between Beams & Condensed Matter-- (1992-)
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
CRYSTAL STRUCTURE
DEPOSITION
ELEMENTS
FILMS
GRAIN SIZE
IRIDIUM
METALS
MICROSTRUCTURE
MOLYBDENUM
PALLADIUM
PLATINUM
PLATINUM METALS
RHENIUM
RHODIUM
SIZE
SURFACE COATING
THIN FILMS
TRANSITION ELEMENTS
TUNGSTEN