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U.S. Department of Energy
Office of Scientific and Technical Information

Vapor deposition of thin films

Patent ·
OSTI ID:7018945

This patent describes a nanocrystalline film, it comprises: a substantially carbon-free metal selected from the group consisting of rhodium, iridium, molybdenum, tungsten, rhenium, platinum, or palladium.

Assignee:
Dept. of Energy, Washington, DC (United States)
Patent Number(s):
A; US 5149596
Application Number:
PPN: US 7-593839
OSTI ID:
7018945
Country of Publication:
United States
Language:
English