Vapor deposition of thin films

Patent · Tue Sep 22 00:00:00 EDT 1992

OSTI ID:7018945

Smith, D C; Pattillo, S G; Saia, Jr, J R; Sattelberger, A P

This patent describes a nanocrystalline film, it comprises: a substantially carbon-free metal selected from the group consisting of rhodium, iridium, molybdenum, tungsten, rhenium, platinum, or palladium.

• Assignee: Dept. of Energy, Washington, DC (United States)
• Patent Number(s): US 5149596; A
• Application Number: PPN: US 7-593839; TRN: 92-037699
• OSTI ID: 7018945
• Resource Relation: Patent File Date: 5 Oct 1990
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
THIN FILMS
CHEMICAL VAPOR DEPOSITION
CRYSTAL STRUCTURE
GRAIN SIZE
IRIDIUM
MOLYBDENUM
PALLADIUM
PLATINUM
RHENIUM
RHODIUM
TUNGSTEN
CHEMICAL COATING
DEPOSITION
ELEMENTS
FILMS
METALS
MICROSTRUCTURE
PLATINUM METALS
SIZE
SURFACE COATING
TRANSITION ELEMENTS
360201* - Ceramics
Cermets
& Refractories- Preparation & Fabrication
360202 - Ceramics
Cermets
& Refractories- Structure & Phase Studies
665300 - Interactions Between Beams & Condensed Matter- (1992-)