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Growth and structure of epitaxial zinc oxide films

Journal Article · · Inorg. Mater. (Engl. Transl.); (United States)
OSTI ID:7008488

We have examined ZnO films made by chemical transport in hydrogen containing a little water vapor and deposited on unoriented single-crystal sapphire or gallium phosphide substrates oriented in the (111)B and (100) planes. The source was ZnO powder at 750-1000/sup 0/C. The films grew at 550-700/sup 0/C for 1-4 h with the mixture traveling from the source to the substrate. At the end growth, the reactor containing the source and the substrates was cooled slowly, while the gas flow was reversed to eliminate uncontrolled growth. The thicknesses were 7-20 ..mu..m, and the resistivities were 0.05.1 Omega x cm, carrier mobilities 5-50 cm/sup 2//V x sec.

OSTI ID:
7008488
Journal Information:
Inorg. Mater. (Engl. Transl.); (United States), Journal Name: Inorg. Mater. (Engl. Transl.); (United States) Vol. 23:9; ISSN INOMA
Country of Publication:
United States
Language:
English