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Fast neutron radiation effects in siicon detectors fabricated by different thermal oxidation processes

Conference · · IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States)
OSTI ID:7000056
;  [1]
  1. Brookhaven National Lab., Upton, NY (United States)
This paper reports on high resistivity silicon detectors along with MOS capacitors made on five silicon dioxides with different thermal conditions (975[degrees]C to 1200[degrees]C) that have been exposed to fast neutron irradiation up to the fluence of a few times 10[sup 14] n/cm[sup 2]. New measurement techniques such as capacitance-voltage (C-V) of MOS capacitors and current-voltage (I-V) of back to back diodes (p[sup +]-n[sup [minus]]-p[sup +] if n[sup [minus]] is not inverted to ;) or resistors (p[sup +]-p-[sup +] if inverted) have been introduced in this study in monitoring the possible type-inversion (n [yields] p) under high neutron fluence. No type-inversion in the material underneath SiO[sub 2] and the p[sup +] contact has been observed so far in this work for detectors made on the five oxides up to the neutron fluence of a few times 10[sup 13] n/cm[sup 2]. However, it has been found that detectors made on higher temperature oxides (T [ge] 1100[degrees]C) exhibit less leakage current increase at high neutron fluence ([phi] [ge] 10[sup 13] n/cm[sup 2]).
DOE Contract Number:
AC02-76CH00016
OSTI ID:
7000056
Report Number(s):
CONF-911106--
Conference Information:
Journal Name: IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States) Journal Volume: 39:4
Country of Publication:
United States
Language:
English