Plasma etching in semiconductor fabrication
Book
·
OSTI ID:6989069
The contents of this book are: Introduction; Plasma Excitation and Reactor Design; Silicon and Silicon Dioxide Etching in Plasmas; Aluminium Etching in Chlorinated Plasmas; The Plasma Etching of III/V Compound Semiconductors; Operating Frequency and the Plasma; Probe Characteristics and Plasma Measurements of an Electrotech Planar Plasma Etcher; The RF Voltage/Current Characteristics and Related DC Negative Bias Properties of an Electrotech Flat Bed Planar Plasma Etcher; and Methods of Reducing the Etch Rate of Positive Photoresist Masks During Plasma Etching.
- OSTI ID:
- 6989069
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
656003* -- Condensed Matter Physics-- Interactions between Beams & Condensed Matter-- (1987-)
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ALUMINIUM
ARSENIC COMPOUNDS
ARSENIDES
CHALCOGENIDES
CHEMICAL REACTIONS
CHLORINATION
DESIGN
ELEMENTS
ETCHING
GALLIUM ARSENIDES
GALLIUM COMPOUNDS
HALOGENATION
METALS
MINERALS
OXIDE MINERALS
OXIDES
OXYGEN COMPOUNDS
PLASMA
PNICTIDES
REACTORS
SEMIMETALS
SILICA
SILICON
SILICON COMPOUNDS
SILICON OXIDES
SURFACE FINISHING
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ALUMINIUM
ARSENIC COMPOUNDS
ARSENIDES
CHALCOGENIDES
CHEMICAL REACTIONS
CHLORINATION
DESIGN
ELEMENTS
ETCHING
GALLIUM ARSENIDES
GALLIUM COMPOUNDS
HALOGENATION
METALS
MINERALS
OXIDE MINERALS
OXIDES
OXYGEN COMPOUNDS
PLASMA
PNICTIDES
REACTORS
SEMIMETALS
SILICA
SILICON
SILICON COMPOUNDS
SILICON OXIDES
SURFACE FINISHING