Studies on ion scattering and sputtering processes in ion beam sputter-deposition of high Tc superconducting films: The optimization of deposition parameters

Conference · Sun Jan 01 04:00:00 EST 1989

DOI:https://doi.org/10.1063/1.39032· OSTI ID:6965189

Ameen, M S; Kingon, A I ^[1]; Auciello, O ^[2]; Krauss, A R ^[3]; Ray, M A ^[4]

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1. North Carolina State Univ., Raleigh, NC (USA). Dept. of Materials Science and Engineering
2. North Carolina State Univ., Raleigh, NC (USA). Dept. of Materials Science and Engineering Microelectronics Center of North Carolina, Research Triangle Park, NC (USA)
3. Argonne National Lab., IL (USA)
4. Microelectronics Center of North Carolin

Ion beam sputter-deposition is one of the techniques used for synthesizing high {Tc} superconducting films in laboratory experiments. However, the scaling-up of this method for technological applications, such as in microelectronics, will require a better understanding of basic phenomena occurring during the deposition process. First results are presented here from experimental and computer simulation studies on ion scattering and sputtering processes. It is demonstrated that scattering of neutralized ions from the targets can result in undesirable erosion of, and inert gas incorporation in, the growing films, depending on the ion/target atom mass ratio and ion beam angle of incidence/target/substrate geometry. The studies indicate that sputtering by Kr{sup +} or Xe{sup +} ions is preferable to the most commonly used Ar{sup +} ions, since the undesirable phenomena mentioned above are minimized for the first two ions. These results are used to determine optimum sputter deposition geometry and ion beam parameters for growing high {Tc} films. 8 refs., 7 figs.

• Research Organization: Argonne National Lab., IL (USA); North Carolina State Univ., Raleigh, NC (USA). Dept. of Materials Science and Engineering
• Sponsoring Organization: DOD; DOE/ER; NSF
• DOE Contract Number: W-31109-ENG-38; FG05-88ER45359
• OSTI ID: 6965189
• Report Number(s): CONF-891093-29; ON: DE90010538
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360201* -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
656003 -- Condensed Matter Physics-- Interactions between Beams & Condensed Matter-- (1987-)
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
CHARGED PARTICLES
COMPUTERIZED SIMULATION
DEPOSITION
FILMS
HIGH-TC SUPERCONDUCTORS
IONS
OPTIMIZATION
SIMULATION
SPUTTERING
SUPERCONDUCTING FILMS
SUPERCONDUCTORS